On 29/08/06, Takeshita K <[EMAIL PROTECTED]> wrote: > This is indeed a "stepper' issue, and not about the usual yield per > wafer argument. > APS-H size sensor is the maximum size that can be obtained by a one > shot exposure in the lithography process using a stepper. i.e., it's > a stepper-driven size limitation. Anything smaller than that indeed > becomes a yield issue, i.e., max obtainable numbers per circular wafer.
Hi Ken, I'd love to see the article. > But most of experts are predicting that APS size sensor has already > become a de facto standard, and with the performance of APS sized > sensor being rapidly increasing, they do not see any pressing need to > rush the FF machines. > > We'll see. My prediction is that anything beyond 10MP in APS format will yield very diminishing returns, noise and dynamics will become more of a problem to control (that's simply tied with the physics of semiconductors) and lens performance will become more of an issue. APS formats will now stagnate IMHO. Cheers, -- Rob Studdert HURSTVILLE AUSTRALIA Tel +61-2-9554-4110 UTC(GMT) +10 Hours [EMAIL PROTECTED] http://home.swiftdsl.com.au/~distudio//publications/ Pentax user since 1986, PDMLer since 1998 -- PDML Pentax-Discuss Mail List [email protected] http://pdml.net/mailman/listinfo/pdml_pdml.net
